[News] Intel Submits Conceptual Drawings for Fab Construction in Germany, Installing High-NA EUV Exposure Machines

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In June 2023, leading processor manufacturer Intel reached an agreement with the German federal government, announcing the signing of an amended investment memorandum. The plan involves investing over EUR 30 billion to construct two new fabs in Magdeburg. The German federal government has agreed to provide a subsidy of EUR 10 billion, including incentives and subsidies from the European Chips Act and government initiatives.

According to a report by Tom’s Hardware citing sources, Intel has submitted conceptual drawings for a new fab in Germany. The initial plans include two fabs, designated as Fab 29.1 and Fab 29.2, equipped with the world’s most advanced semiconductor tools.

Moreover, Intel reportedly has ample space for up to six additional fabs. The first batch of two fabs is expected to commence operations in the fourth quarter of 2027, with both the Intel 14A (1.4nm) and Intel 10A (1nm) advanced processes believed to be part of the plan.

As per previous reports from TechNews, Intel has not disclosed any details regarding the 10A node, but it promises at least double-digit improvements in power consumption and performance. Intel CEO Pat Gelsinger has previously stated that new processes typically improve critical dimensions by approximately 14% to 15%. Therefore, it is plausible that the 10A and 14A nodes will also experience similar improvements.

As per Intel’s roadmap, Intel 14A is also optimized in 2027, so it seems that 10A falls between 14A and 14A-E.

The report from Tom’s Hardware further indicates that Fab 29.1 and Fab 29.2, the two three-story buildings, occupy approximately 81,000 square meters, with a total length of 530 meters and a width of 153 meters. Each floor has a height ranging from 5.7 to 6.5 meters. Including the roof structure for air conditioning and heating, the building reaches a height of 36.7 meters.

The High-NA EUV exposure machines are installed on the second floor with a height of 6.5 meters, while the upper and lower floors are used for material logistics, providing necessary resources such as water, electricity, and chemicals.

ASML models that the 1st generation of the High-NA-enabled production node will employ between 4 to 9 High-NA EUV exposures and a total of 20 to 30 EUV exposures, encompassing both Low-NA and High-NA.

 

Read more

• [News] Advancing into Intel 10A! Intel’s 2027 Blueprint Adds 1-Nanometer Process
• [News] Intel Promotes 1.8-Nanometer Process in South Korea, Reportedly Pledges Various Benefits to Startups

(Photo credit: Intel)