Unlike other major semiconductor manufacturers, including Intel and TSMC, memory giant Micron is not in a hurry to adopt EUV (extreme ultraviolet) lithography for its DRAM production. However, according to a latest report from Technews, in 2024, Micron plans to begin trial production using EUV on its 1γ (1-gamma) process technology at 10-nm level.
The report also notes that currently, all of the company’s mass-produced products are made using DUV (deep ultraviolet) lithography. However, after entering trial production in 2024 with EUV, Micron also anticipates that this process technology will enter large-scale production in 2025.
Another Korean memory giant, Samsung, announced in 2020 that it has successfully shipped one million of the industry’s first 10nm-class (D1x) DDR4 (Double Date Rate 4) DRAM modules based on EUV technology.
In 2021, SK hynix has started mass production of its 10-nm DRAM chips using EUV technology, and is said to invest USD 1.5 billion this year to acquire 8 advanced EUV lithography machines, according to an earlier report from Disc Manufacturer.
Previously, Micron CEO Sanjay Mehrotra stated during an earnings call that the trial production of 10-nm-class 1γ (1-gamma) process DRAM using EUV lithography is progressing well, and they are on track to achieve mass production by 2025 as planned. Currently, Micron is developing the 10-nanometer-class 1γ process DRAM manufacturing technology using EUV lithography at its Hiroshima plant in Japan, which is also the first site for the trial production of 1γ memory, according to Technews.
In order to meet the strong demand for high-performance memory chips driven by AI, Micron is reportedly building a pilot production line for HBM in the U.S. and is considering producing HBM in Malaysia for the first time.
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