[News] Samsung Reportedly Reduces Procurement of ASML’s Next-Generation EUV Lithography Equipment

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According to a report from South Korean media outlet BusinessKorea citing sources, Samsung Electronics is said to be planning to reduce its procurement of ASML’s next-generation Extreme Ultraviolet (EUV) lithography equipment. Additionally, their joint plan to build a research and development center in South Korea may also in limbo.

Reportedly, Samsung Electronics initially planned to purchase more than three units of the next versions, EXE:5200, EXE:5400, and EXE:5600, over the next ten years. However, the company has now decided to introduce only the EXE:5200 and will reconsider the introduction of subsequent versions in the future.

This decision came after Vice Chairman Jun Young-hyun was appointed as the new head of the DS (Device Solutions) division and reviewed ongoing projects and investments.

Samsung and ASML’s strategic partnership originated from a visit in December last year, when President Yoon Suk Yeol led a delegation to ASML’s headquarters in the Netherlands. The delegation included representatives from South Korean semiconductor giants Samsung and SK hynix, according to the Korea Times.

During the visit, Samsung and ASML signed an MOU, agreeing to jointly invest approximately KRW 1 trillion (about USD 7.6 billion) to establish a research fab in South Korea.

However, with Samsung’s decision to reduce equipment introduction, the related process has been completely halted. It remains to be seen whether the joint research center will be established in another location or if the project itself will be canceled, pending future discussions.

Kyung Kye-hyun, who was the head of the DS division at the time and is now leading the Future Business Planning Team and SAIT (Samsung Advanced Institute of Technology), emphasized the importance of establishing a cooperative relationship through joint research for High NA EUV.

He noted that Samsung now has a technical priority for “High NA EUV” and mentioned that the company believes it has created an opportunity to utilize High NA EUV effectively in DRAM or logic semiconductors in the long term.

Despite the revised plans, as per Business Korea citing a Samsung Electronics official, it pointed out that there is no change in the plan to introduce ASML High NA EUV equipment and assured that the R&D center of the two companies will still be established in the optimal location.

Read more

• [News] Samsung Reportedly to Bring in High-NA EUV Machine as soon as Year-End, as SK hynix Targets 2026
• [News] Samsung, ASML Invest KRW 1 Trillion in Korean Research Fab as Netherlands-Korea Semiconductor Alliance Formed

(Photo credit: 대한민국 대통령실)