[News] Intel Completes Assembly of Second High-NA EUV System, ASML Confirms

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According to a report from TechNews, Christophe Fouquet, the CEO of ASML, announced that Intel’s second high-NA EUV system has been completely assembled.

Christophe Fouquet stated that the High-NA EUV machine is less likely to face delivery delays compared to the current standard EUV machines because it can be assembled directly at the customer’s facility, eliminating the need for disassembly and reassembly. This approach saves both time and costs for ASML and its customers, helping to expedite delivery, the report noted.

Mark Phillips, the Director of Lithography Hardware at Intel, announced that the company has successfully completed the installation of two High-NA EUV systems at its Portland facility.

Moreover, Mark Phillips highlighted that the improvements offered by High-NA EUV machines surpass expectations when compared to standard EUV machines.

Mark Phillips also noted that the installation of the second High-NA EUV system was completed even faster than the first. He stated that all necessary infrastructure for the High-NA EUV system is in place, and inspections of the masks used for High-NA EUV have begun as scheduled. As a result, Intel is well-positioned to move into production with minimal additional effort.

Additionally, Mark Phillips was asked about the issue of CAR (Chemically Amplified Resist) versus metal oxide resists. According to the report by TechNews, he stated that while CAR is currently sufficient, there may be a need for metal oxide photoresists at some point in the future. Intel aims to have its Intel 14A process in mass production by 2026-2027, at which point further advancements in the node will be made.

Intel’s early adoption of ASML’s High-NA EUV equipment is seen by many as a crucial move for Intel to reclaim its technological leadership.

Regarding other semiconductor giants, ASML previously confirmed that it will deliver its latest High-NA EUV systems to TSMC by the end of this year. According to a report from the Economic Daily News, it is rumored that TSMC’s first High-NA EUV equipment arrived in September, which will support the company in advancing its process technology.

On the other hand, while Samsung has also decided to purchase ASML’s High-NA EUV equipment, a report from South Korean media outlet BusinessKorea suggests that the company is planning to reduce its procurement of ASML’s next-generation EUV lithography equipment, after Vice Chairman Jun Young-hyun was appointed as the new head of the DS (Device Solutions) division and reviewed ongoing projects and investments.

Read more

• [News] TSMC Strengthens Its Advanced Process with Next-Generation EUV Equipment Reportedly Arriving This Month
• [News] Samsung Reportedly Reduces Procurement of ASML’s Next-Generation EUV Lithography Equipment

(Photo credit: ASML)