[News] Intel and AIST to Establish R&D Hub in Japan, Focusing on Introducing EUV Lithography

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Intel and Japan’s National Institute of Advanced Industrial Science and Technology (AIST), under the Ministry of Economy, Trade and Industry, are reportedly planning to set up an R&D hub in Japan. As per a report from Tom’s Hardware, the new facility is expected to be built within the next 3-5 years, with a total investment projected to reach hundreds of millions of dollars.

According to a report from Nikkei on September 3rd, this facility is said to be putting more focus on developing advanced semiconductor manufacturing equipment and materials, as well as introducing Extreme Ultraviolet (EUV) lithography.

On the other hand, the hub will feature EUV lithography equipment, with AIST overseeing operations and Intel providing expertise in semiconductor manufacturing using EUV equipment.

The report from Nikkei indicates that Rapidus, expected to mass-produce 2nm chips by 2027, will introduce Japan’s first EUV lithography equipment in December 2024. The planned R&D hub, per Nikkei, will become the first research institution in Japan to incorporate such tool. The hub is also considering technical collaboration and talent exchange with U.S. research institutions.

Reportedly, EUV lithography equipment is essential for producing advanced chips below 5nm, but each unit costs over JPY 40 billion, making it difficult for materials and equipment manufacturers to purchase independently.

Therefore, semicondcutor companies may have to be rely on certain research institutions’ EUV equipment overseas to conduct research and product development, such as imec.

The global semiconductor foundry leader, TSMC, established a next-generation semiconductor R&D hub in Ibaraki Prefecture, Japan, in June 2022. Additionally, Samsung Electronics plans to set up a chip R&D center in Yokohama, Japan, by the end of 2024.

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(Photo credit: Intel)