Intel’s foundry has extended its public roadmap, incorporating the Intel 14A process into the advanced process schedule and adding specific nodes. However, recent modifications to the roadmap have moved Intel 14A forward to 2026 and introduced a new process in 2027, namely 1 nanometer (Intel 10A).
According to TechNews citing reports from global media outlets tom’s Hardware and Extremetech, this marks Intel’s first announcement of the commencement of the 1-nanometer process. Although Intel had introduced Intel 10A at its exhibition, the news was restricted until now and has just been disclosed.
Intel 10A is set to enter the production/development (non-mass production) phase in 2027, while Intel 14A (1.4 nanometers) is scheduled for early production in 2026. Additionally, Intel is committed to constructing a fully autonomous AI-driven fab.
Keyvan Esfarjani, Intel’s Executive Vice President and General Manager of Manufacturing and Supply Chain, introduced the latest developments and showcased the technical roadmap. Intel plans to commence development of the 10A node by late 2027 to address gaps in EUV technology.
Assuming that Intel successfully launches its 1.8-nanometer process next year, follows with a 1.4-nanometer process in 2026, and then advances to 1-nanometer in 2027, Extremetech’s report claims that Intel is likely to be ahead of its competitor TSMC. TSMC estimates to begin its 2-nanometer process around 2025 or 2026, followed by a 1.4-nanometer process thereafter.
However, Intel has not disclosed any details regarding the 10A node, but it promises at least double-digit improvements in power consumption and performance. Intel CEO Pat Gelsinger has previously stated that new processes typically improve critical dimensions by approximately 14% to 15%. Therefore, it is plausible that the 10A and 14A nodes will also experience similar improvements.
As per Intel’s roadmap, Intel 14A is also optimized in 2027, so it seems that 10A falls between 14A and 14A-E.
It is worth noting that according to Intel’s presentation notes, the final scale, speed, and process depend on commercial conditions and incentives, implying that funding from the U.S. Chip Act will affect expansion capacity.
Current Technological Developments at Intel
Intel’s 20A integrates two new technologies: backside power (PowerVIA) and GAA transistors (RibbonFET). Additionally, there is a proactive effort to enhance production capacity for advanced packaging technologies such as Foveros, EMIB, SiP (Silicon Photonics), and HBI (Hybrid Bond Interconnect).
Recently, Intel concluded all internal packaging for standard packaging, redirecting focus entirely towards high-end packaging, with standard packaging tasks now handled by OSATs (outsourced assembly and test companies).
While Intel’s 18A production base is located in Arizona, the location for manufacturing the 10A node has not been disclosed.
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(Photo credit: Intel)