According to reports, the Lawrence Livermore National Laboratory (LLNL) in the United States is developing a petawatt-level laser based on the element thulium. This laser is said to have the potential to improve the efficiency of extreme ultraviolet (EUV) lithography light sources by approximately t...

As semiconductor giants Intel and TSMC have been bringing in ASML’s High- NA EUV machines, how major South Korean chip companies approach extreme ultraviolet (EUV) lithography technology also comes into spotlight. Interestingly, Samsung and SK hynix are adopting differing strategies on EUV, as per...

According to Liberty Times, ASML President and CEO Christophe Fouquet discussed geopolitical issues in the semiconductor industry and China lagging behind the West in chip manufacturing during an interview with the Dutch media outlet NRC. Regarding the U.S.'s ongoing restrictions on China's sem...

According to media reports, market sources previously indicated that TSMC received its first High-NA (High Numerical Aperture) extreme ultraviolet (EUV) lithography machine, the EXE:5000, from Dutch semiconductor equipment manufacturer ASML in September 2024. This marks a shift in TSMC's stance t...

According to a report from MoneyDJ, citing Nikkei, the EUV lithography equipment ordered by Rapidus is expected to arrive at New Chitose Airport in mid-December. The machine will be transported using multiple large cargo planes. This will mark the first introduction of EUV lithography equipment in J...