According to media reports, market sources previously indicated that TSMC received its first High-NA (High Numerical Aperture) extreme ultraviolet (EUV) lithography machine, the EXE:5000, from Dutch semiconductor equipment manufacturer ASML in September 2024. This marks a shift in TSMC's stance t...

According to a report from MoneyDJ, citing Nikkei, the EUV lithography equipment ordered by Rapidus is expected to arrive at New Chitose Airport in mid-December. The machine will be transported using multiple large cargo planes. This will mark the first introduction of EUV lithography equipment in J...

While TSMC is making advancements on its 2nm at full throttle, an unexpected risk may be emerging, which might be more severe than most could imagine: power supply. Citing a report by S&P, a report by Wccftech highlights that compared with 2023, the foundry giant’s electricity consumption coul...

Has the new semiconductor manufacturing equipment capable of rivaling ASML’s EUV lithography machines been shipped? Canon has announced that it will deliver its latest lithography platform, the FPA-1200NZ2C nanoimprint lithography (NIL) system for semiconductor manufacturing, to the Texas Institut...

According to a report by the Economic Daily News, TSMC's first high numerical aperture extreme ultraviolet lithography (High-NA EUV) equipment will arrive this month, aiding the company in progressing its advanced process technology. Regarding these rumors, ASML stated on September 9 that it doe...