According to media reports, market sources previously indicated that TSMC received its first High-NA (High Numerical Aperture) extreme ultraviolet (EUV) lithography machine, the EXE:5000, from Dutch semiconductor equipment manufacturer ASML in September 2024. This marks a shift in TSMC's stance t...

According to a report from TechNews, citing a report from Nikkei, TSMC is set to receive ASML's most advanced High NA EUV lithography machines before the end of the year. The machine, known as high numerical aperture extreme ultraviolet (High NA EUV) lithography equipment, costs over USD 350 mil...

As ASML accidentally released its financial report nearly a day ahead of its schedule due to a “technical error,” the Dutch semiconductor giant’s Q3 performance and its forecast for 2025 have also startled all by reporting orders at half of what the market predicted, raising concerns on the la...

According to a report from TechNews, Christophe Fouquet, the CEO of ASML, announced that Intel's second high-NA EUV system has been completely assembled. Christophe Fouquet stated that the High-NA EUV machine is less likely to face delivery delays compared to the current standard EUV machines bec...

According to a report by the Economic Daily News, TSMC's first high numerical aperture extreme ultraviolet lithography (High-NA EUV) equipment will arrive this month, aiding the company in progressing its advanced process technology. Regarding these rumors, ASML stated on September 9 that it doe...