High-NA EUV


2024-09-10

[News] TSMC Strengthens Its Advanced Process with Next-Generation EUV Equipment Reportedly Arriving This Month

According to a report by the Economic Daily News, TSMC's first high numerical aperture extreme ultraviolet lithography (High-NA EUV) equipment will arrive this month, aiding the company in progressing its advanced process technology. Regarding these rumors, ASML stated on September 9 that it doe...

2024-09-04

[News] A14 Node to Utilize High-NA EUV, with TSMC Likely to Adopt the Technology

TSMC, along with research teams like imec, continues to push the boundaries in pursuit of optimal solutions for achieving high bandwidth and low power consumption on the same chip area. As per a report from Commercial Times, Imec has even mapped out a blueprint for the Angstrom era, with the pote...

2024-08-20

[News] Samsung Reportedly Reduces Procurement of ASML’s Next-Generation EUV Lithography Equipment

According to a report from South Korean media outlet BusinessKorea citing sources, Samsung Electronics is said to be planning to reduce its procurement of ASML's next-generation Extreme Ultraviolet (EUV) lithography equipment. Additionally, their joint plan to build a research and development cente...

2024-08-07

[News] ASML’s Second High-NA Equipment to be Installed in Intel’s Oregon Fab Soon

Per a report from Reuters, Intel is said to be receiving the second new High-NA EUV equipment from ASML, costing EUR 350 million (~USD 383 million). According to Intel's earnings call on August 1, CEO Pat Gelsinger stated that Intel began receiving the first large equipment in December, and the i...

2024-07-30

[News] TSMC Reveals High-NA EUV Equipment Will Be Adopted at the Right Time

As the semiconductor industry continues to advance, it has sparked an arms race among Samsung, Intel, and TSMC in acquiring extreme ultraviolet (EUV) equipment. When asked about when TSMC would adopt the extremely expensive High Numerical Aperture EUV (High-NA EUV) lithography equipment, as per a re...

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