Intel's early adoption of ASML's High Numerical Aperture Extreme Ultraviolet Lithography (High-NA EUV) equipment is seen by many as a crucial move for Intel to reclaim its technological leadership. Yet, according to a report from CNA, industry sources cited in the report have warned that the high co...

According to sources cited by a report from Economic Daily News, TSMC's A16 advanced process node might not necessarily require ASML's latest advanced chip manufacturing equipment, the High Numerical Aperture Extreme Ultraviolet Lithography (High-NA EUV), due to its expensive price. Per a report ...

TSMC announced during its briefing on the 18th that, due to robust demand in the 2-nanometer market, it plans to add another fab to the initially planned two fabs in Kaohsiung. The company intends to use the 2-nanometer process for all three fabs in Kaohsiung, in addition to the originally planne...