According to ChinaTimes’ report, Intel’s strides in European chip manufacturing are narrowing the gap with TSMC.

The Fab 34 in Ireland has taken a significant step in production using EUV for the first time, with Intel 4 technology equivalent to the original 7nm. The research firm IC Knowledge has once assessed that Intel 4 is ahead of TSMC’s 5nm process, emphasizing energy efficiency, which makes it more suitable for mobile devices.

Industry sources note that the upcoming Meteor Lake CPU will adopt the Intel 4 process, and Intel 3 is planned for release by the end of the year. With Intel’s Ireland facility entering mass production, it significantly reduces the gap with TSMC.

Meteor Lake is poised to become the first processor utilizing Intel 4 fabrication technology, marking a milestone as the inaugural process to support EUV lithography exposure.

While the Compute tile is manufactured using Intel 4, the Graphic tile, SoC tile, and IO tile are completed using TSMC’s 5/6nm process. Industry source suggests that TSMC still maintains superior yield rates and more advantageous production costs.

Intel is establishing an advanced semiconductor manufacturing value chain in Europe. Fab 34 in Leixlip, Ireland, is operational, and there are plans to build a fab in Magdeburg, Germany, and an assembly testing facility in Wroclaw, Poland. This positions Intel ahead of TSMC in global layout.

Intel aims to regain a leading position in process technology by 2025, and will receive the industry’s first set of High-NA EUV lithography exposure equipment by the end of the year. The “Intel 3” will kick off vigorously. As Moore’s Law reaches its limits, TSMC, as a frontrunner, will face a gradually narrowing gap with competitors.

Read more

• [News] Intel’s Next Gen CPU to Produce at TSMC with 3nm in First Half of Next Year
• [News] Intel’s Processor Upgrades: Impact on TSMC’s Revenue Awaited

(Photo credit: Intel)

According to Taiwan’s TechNews report, Intel has revealed the architecture and supply schedule of the new generation data center Xeon processors, Sierra Forest and Granite Rapids. They are also set to unveil the consumer processor codenamed Meteor Lake in mid-September. However, with the semiconductor market’s current weak recovery, the impact of Intel’s new processors on driving upgrades and benefiting Taiwanese supply chain manufacturers remains uncertain, making it a market focal point.

Regarding the consumer-oriented Meteor Lake processor, industry sources suggest that it will not only be the first to adopt “Intel 4” technology, but also the first to utilize EUV lithography for cost reduction in mass-producing CPU tiles. TSMC will assist in production using the 5/6 nanometer process for graphics chip modules (GFX tile), system chip modules (SoC tile), and input/output chip modules (IOE tile), aiming for higher yields to decrease production costs.

Furthermore, the Meteor Lake processor shifts from traditional monolithic chip design to chiplet technology. After separating functions like graphics, system, and I/O chips, it employs the 3D Foveros advanced packaging technology. Through Foveros interconnects, multiple chiplets are vertically stacked into one chip. This approach not only increases the yield of critical modules but also reduces costs, granting Intel greater flexibility in rapidly creating next-generation chip capacities.

For the upcoming Meteor Lake processor, its direct beneficiary is undoubtedly TSMC, which assists in producing graphics chip modules, system chip modules, and input/output chip modules using the 5/6 nanometer process. This collaboration not only boosts revenue but also maintains the ongoing partnership with Intel.

However, despite Taiwanese foundries and board manufacturers securing orders for Intel’s new-generation processors, the current economic environment remains unfavorable. With a cautious and conservative outlook on consumer spending in the global market, the launch of Intel’s new products could either boost supply chain revenue or lead to increased inventory in the next phase, requiring further observation.

(Photo credit: Intel)