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As the competition in advanced semiconductor chip manufacturing industry heats up, EUV lithography machine has been sought after by the market, attracting great attention across the industry.
Currently, Intel has taken the lead by purchasing ASML’s High-NA EUV lithography equipment and announced the completion of assembly recently. Samsung is also stepping up its efforts by partnering with Zeiss, a supplier of components for ASML’s EUV lithography machine, to deepen cooperation in the EUV field. At the same time, rumor has surfaced about the delivery of ASML’s second High-NA EUV lithography machine, though the buyer remains undisclosed.
According to South Korean media The Korea Herald report, Jay Y. Lee, the vice chairman of Samsung Electronics, recently met with Karl Lamprecht, President and CEO of Zeiss, along with other company executives in Germany.
During the meeting, both parties agreed to expand cooperation in EUV technology and cutting-edge semiconductor equipment development to enhance their competitiveness in the foundry and memory chip sectors. Through this collaboration, Samsung aims to advance next-generation semiconductor technology, optimize chip manufacturing processes, and improve the yield of advanced chips.
Zeiss also plans to invest KRW 48 billion by 2026 to establish a research and development center in South Korea as a way to strengthen strategic cooperation with South Korean companies including Samsung.
As a developer of optical and optoelectronic solutions, Zeiss serves as the exclusive supplier of components for ASML’s EUV lithography machines, with each machine containing over 30,000 components made by Zeiss. Zeiss holds more than 2,000 core patents about EUV technology, and its expertise can make a significant difference in the production of high-performance advanced chips.
In the future, Samsung Electronics and Zeiss will further expand their cooperation in EUV technology and related fields of advanced semiconductor equipment.
Recently, Intel announced it has completed installation of the ASML High NA EUV lithography machine, which has now entered the optical system calibration phase. This represents the first High NA EUV lithography machine produced by ASML, valued at up to EUR 350 million. Intel plans to use this equipment to produce advanced process chips below 1.8nm.
In addition to Intel, companies such as TSMC, Samsung, and Micron have also placed orders for the High NA EUV lithography machine from ASML. ASML’s financial report for the first quarter of this year revealed a total of EUR 3.6 billion order intakes, with EURO 656 million from EUV lithography machine orders. ASML recently delivered its second equipment without revelation of the buyer.
The two High NA EUV lithography machines are insufficient to meet the market demand for advanced process chips. Therefore, ASML plans to manufacture more high-end lithography equipment in the future to address the continuously growing market demand.
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(Photo credit: ASML)